ability to install multiple vacuum based deposition coating modules from leading vendors
Remote RF Plasma
Reactive Ion etch
HiPiMS (High Power Impulse magnetron
PECVD (Plasma Enhanced Chemical Vapour
ALD (Atomic Layer Deposition)
types of flexible substrates up to 500mm wide i.e. Films, Flexible Glass, PET, PI, PEN, etc., Foils
web paths as standard , In contact ,
Non-contact, interleaving etc.
options to offer a tailored flexible solution
which can be added to at a later date as platform is
both PLC and service prepared.
and play on site the machine will be fully
tested before dispatch and container friendly.